Standard-cell and SRAM characterization: Supports standard-cell and SRAM characterization and capacitance solving for critical paths.
Accurate critical-net capacitance extraction: Supports precise extraction of total capacitance (Total-Cap) and coupling capacitance (Coupling-Cap).
Multi-scale modeling: Supports multi-scale modeling from BEOL, Pcell, and standard cell up to SRAM arrays, enabling analysis and optimization at different hierarchy levels.
Advanced process structure support: Supports parasitic extraction for planar MOSFET, FinFET, nanosheet, and CFET processes, with accuracy down to 0.1nm.
Deep correlation with foundry golden data: Accuracy certified by multiple tier-1 foundries.
High parallelism and low memory:Low memory footprint with powerful parallel and hierarchical compute capabilities, scaling to thousands of CPU cores.
3D graphical viewer: Lisplays precisely modeled process data charts and 3D structures, with accurate characterization of conductor and dielectric parameters.
Tech file encryption: Supports tech file encryption to ensure foundry process-information